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E. P., a graduate of the École des Beaux-Arts in Nancy, successfully integrated holography into his artistic practice, making this technique his true signature. His passion for this art led him to explore both the theoretical and practical aspects of holography in depth, which eventually led him to found the production company PHAM Holographie in 1985.He created numerous large-scale holograms and artworks, often intended for major events, product launches, or installations related to visual communication. His expertise and know-how allowed Eric to establish himself as a major figure in the field of hologram production.
Now retired and also living in Lorraine, near Nancy, Eric joined Jean-Claude after a chance meeting, driven by the desire to combine their skills and their shared passion for holographic imaging. Together, they founded the Hololab-Factory association in 2023, with the ambition of advancing research and innovation in this field—much like the transition from black-and-white photography to color—by aiming to create artistic, analog, and digital color holograms.

A retired research and development engineer, JCT devoted his career to technological innovation. His professional journey is marked by key milestones, including his pioneering role in the field of holography during the 1980s.
During that time, he founded the HOLOGRAPHIA holography laboratory in Nancy in 1986, which distinguished itself by successfully producing and commercializing high-efficiency holograms made using the first DuPont™ photopolymer films.
His expertise later led him to Holtronic Technologies in Neuchâtel, Switzerland, where he developed and explored holographic applications and devices for the microlithography industry, such as TIR holographic mask aligners (Total Internal Reflection holographic recording systems) and TIR HOEs (Holographic Optical Elements).
Publications:
OPTICAL ENGINEERING: “Holographic Mask Aligner” (ISSN 0091-3286, October 1993) – Institute of Microelectronics, University of Neuchâtel, CSEM:
“Interferometric and TIR Holographic Fabrication for High Carrier Frequency Surface Relief Elements” – SPIE Microlithography, San Jose, USA:
“High Resolution Holographic Mask Aligner” – Program and as part of the Esprit project AIMFED:
“Large-field, high-resolution photolithography”)ISDH 2025:
“Innovative and Dependable Approach for Recording True-Color Transmission Holograms Free from Crosstalk Artifacts”